Used TECHNICS Micro RIE 800 #9239257 for sale

TECHNICS Micro RIE 800 is an etcher, or asher, which is a type of equipment used to etch, or remove, material from a surface by chemically reacting it with a plasma. It is designed for plasma etching of very small features and materials such as semiconductor wafers, membranes, displays, and carbon nanotubes. Micro RIE 800 has a plasma source consisting of a microwave source providing up to 800 W of microwave power. It also features a matching equipment for accurate power delivery to the RF plasma chamber. This ensures uniform etching across the entire sample. The etching chamber itself is a pressure-controlled, semi-confined etching chamber, with dimensions of 400x277x157mm. It is designed to inject a precisely aimed Ar/O2 plasma at the surface of the sample. TECHNICS Micro RIE 800 also has a 6-channel gas delivery system with a control resolution of 0.1 SLM. This allows for the precise control of the plasma chemistry. Safety is ensured by the inclusion of a sensor to ensure safe operating pressure inside the etching chamber. Along with this, there is an RF power monitor embedded in the unit that will protect the ETCHER in case of any excessive power delivery. Micro RIE 800 has a modular design, so users can easily upgrade through the addition of additional modules. This allows for greater flexibility and allows users to customize the machine to suit their specific requirements. In addition, the tool is designed to be extremely efficient, with high etching rates and minimal sample damage. TECHNICS Micro RIE 800 is easy to use and is suitable for a range of micro etching applications. It has a user-friendly touchscreen interface that allows for intuitive operation. It also includes a set of remote operation software, with which a user can monitor the etching process remotely. This provides users with complete control over their etching process. Overall, Micro RIE 800 is an excellent tool for precision etching of very small features and materials. It combines a powerful microwave source and optimized matching asset to provide high etching rates and excellent sample quality.