Used TEGAL 411 #9003951 for sale

TEGAL 411
Manufacturer
TEGAL
Model
411
ID: 9003951
Plasma asher Aluminum chamber, 6" x 6" x 10" (W).
TEGAL 411 is an advanced etcher/asher, specifically designed for high-volume production jobs. It has a high-efficiency, high-precision, and high-throughput platform that enables users to process numerous wafers at once. It provides superior wafer adhesion to the substrate, eliminating the need for manual tape alignment. It is equipped with a high-density beam generator for better control and accuracy over etch depth and alignment. 411 utilizes an ultra-fast, non-contact, photolithography based imaging equipment. This system uses lasers to transfer a pattern paper or master copy directly to a target substrate. This unit is designed for high-volume, high-quality production and offers rapid turnaround times and is ideal for repeatable etching processes. The etcher is built with an advanced vacuum machine that delivers cleaner, more efficient etching. Its integrated vacuum tool has an adjustable pressurized chamber to ensure the ideal environment for all the substrates. Additionally, it features a dual thermoelectric cooling platform to ensure uniform etching temperature and adhesion of the substrate to the target substrate. TEGAL 411 comes with an intuitive user interface which enables operators to easily program and monitor their etching processes. It is also compatible with various PC software packages that allow users to customize the process with accuracy and precision. In addition, 411 also offers online monitoring capabilities so operators can keep a close eye on the progress of their etching jobs from their desktops or laptops. It also allows operators to set up email alerts for job completion or other adjustments. Above all, TEGAL 411 is one of the most sophisticated etchers in the industry. It is designed specifically for high-volume production work, making it ideal for any etching application. Its high-tech asset ensures excellent adhesion to the substrate, allowing for precise and repeatable process results.
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