Used TEGAL 415 #9010610 for sale
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ID: 9010610
Plasma asher
Aluminum chamber ID 6" x 6" x 10"
Options:
Direct drive pump
Fomblin/Krytox prep (if pumping explosive gas)
Reclaimed Fomblin/Krytox oil available.
TEGAL 415 is a top-performance etcher/asher used to perform a range of etching/ashing processes needed for the production of semiconductor circuits and devices. This etcher/asher features several unique attributes that make it ideal for a variety of semiconductor etching/ashing processes, especially those that involve wet etching and ashing. The prominent feature of 415 etcher/asher is its ability to achieve high-quality etching/ashing results with a wide variety of substrate materials, including metals, polysilicon, quartz, and GaN. This is made possible with the addition of several specialized software packages for controlling the process. These packages allow users to adjust the etching/ashing parameters, such as etching/ashing pressure and timing, to achieve the best possible results. In addition, TEGAL 415 comes with an advanced system of temperature control, ensuring that all ashing and etching processes are completed with precise and consistent results. 415 also features a state-of-the-art environmental chamber, helping to keep the temperature consistent and maintaining the optimum conditions for etching/ashing processes. This chamber is equipped with a multitude of specialized sensors that monitor the environmental conditions in the chamber and continuously adjust the etching/ashing parameters to ensure the best possible results. Furthermore, the environmental chamber is designed to be corrosion-resistant and able to work in a variety of different temperature past the normal range. TEGAL 415 also includes a gas supply system, ensuring that etching/ashing pressure and gas flow are kept within the optimal range for each process. This gas supply system ensures that etching/ashing processes are able to be performed with the utmost efficiency and consistency. 415 is a highly advanced etcher/asher, designed to complete the most demanding etching/ashing processes with precision and accuracy. Its extensive features make it an ideal choice for a wide range of applications, from semiconductor device production to advanced research and development.
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