Used TEGAL 515 #9192920 for sale

TEGAL 515 is an etcher/asher equipment designed and manufactured by Lam Research Corporation. This wafer etcher/asher system is primarily utilized for semiconductor materials removal. 515 utilizes a powerful process chamber and features a multi-deck source design with a large multi-dielectric-path gas delivery unit. TEGAL 515 comes equipped with a main chamber, a high-density plasma machine (HDP), and an independent turbopump. The main chamber is a temperature-controlled, isolated process chamber that is highly efficient with low power consumption. This chamber provides a controlled environment for efficient removal without the presence of thermal gradients or mechanical interactions between the wafer and process gasses. The main chamber also eliminates the potential for contamination which could occur from direct or indirect thermal radiation. The HDP tool provides a high density plasma to create plasma assisted chemical etching and is capable of operating on multi-layered photomasks. To further increase the etching precision, a low impact ion source is included. The ion source is also used to create plasma assisted deposition. The independent turbopump ensures a consistent and stable vacuum environment in the process chamber by actively controlling the pressure in the process chamber. The turbopump can achieve operating pressures down to 10-7 mbar. 515 is equipped with a variety of gas supply options which can be activated in either a bubbler or bubbler-free delivery configuration. The gas supply options include nitrogen, oxygen, argon, carbon dioxide, and sulfur hexafluoride. The integrated gas supply allows for the use of multiple processing gases and can be further optimized to meet the specific process needs of each application. TEGAL 515 also has enhanced safety and reliability features that include an electromagnetic interference protection asset and its modular configurable design makes installation and maintenance a breeze. Finally, its programmable interface allows for automated pre-processing, in-situ reporting, and end of run data collection. With its enhanced safety features, high density plasma model, independent turbopump, and programmable interface, 515 etcher/asher from Lam Research Corporation is an ideal choice for semiconductor material removal.