Used TEGAL 701 #104111 for sale
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ID: 104111
Wafer Size: 4"
Vintage: 1995
Plasma in-line etcher, 4"
Process capability: 4" wafer with 15 wafer/ hour
Utilities:
N2: 10—20 psig
SF6: 10—20 psig
O2 :10—20 psig
He : 10—20 psig
Chilled water: 20—40 psig
For RF supply
Electrical power:
110 VA, single phase, 50/60 Hz
For Vacuum pump
208 VAC, 15 Amp
1995 vintage.
TEGAL 701 is a high-resolution, computer-controlled dry etcher designed for micro-structuring on small wafers and substrates. It is a versatile etching tool that can handle a wide range of etching processes, making it an ideal choice for both research and production applications. 701 utilizes an advanced software system to monitor the etching process, allowing the user to customize the etching parameters to get the best results. The etcher features a wide range of options for controlling etch rate, substrate temperature, etch angle, and gas flow. Additionally, the advanced Automatic Pressure Control (APC) system ensures that the pressure within the chamber remains constant, regardless of the chemistry used. TEGAL 701 also offers automated quick Changeover (QCO) capability, which facilitates highly efficient and safe transfer of wafers between different processes of etching, such as from wet etching to dry etching. This assures consistently high-quality etching performance, without spending extra time for increased etch-rate stability. 701 also offers a high degree of flexibility for plasma etching of a variety of materials such as silicon, metals, ceramics, and semiconducting materials. The etcher includes a specially designed Thermal Plasmatron source, capable of reaching temperatures of up to 1000°C with minimal plasma damage. Furthermore, the etcher also offers low-pressure vacuum etching with low-concentration, inert gas mixtures and high-pressure, pure-gas etching. TEGAL 701 is also capable of performing deep etching, with vertical resolution of 250nm and horizontal resolution of 75nm. Additionally, its built-in, real-time wafer tracking system allows the user to accurately and precisely position the wafers for etching. Overall, 701 is a powerful, flexible, and reliable dry etcher for a wide variety of etching processes. Its advanced control software, automated quick Changeover, and high-end etching capabilities make it an ideal choice for both research and production needs.
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