Used TEGAL 701 #9000660 for sale

TEGAL 701
Manufacturer
TEGAL
Model
701
ID: 9000660
Plasma in-line etcher, 4" In-operable.
TEGAL 701 is an etcher/aser designed for precision processing of silicon and compound semiconductor wafers. It features advanced etching capabilities and is suitable for a wide range of applications, from accurate surface structuring to processing and fabrication of custom devices. 701 is fully automated and features several mode choices, allowing users to tailor their etching for the exact requirements of their device. Its built-in gas delivery equipment can accurately and precisely meter process gases for maximum etching precision. The unit has a source power of 1600W and plasma pressures up to 1.2 Pa (9 mTorr), with processing gases including fluorine, chlorine, oxygen, and hydrogen sulfide. The system is fitted with a manually adjustable workpiece platform, allowing users to move and position wafers without having to remove them from the etcher. Its easy user interface allows for simple operation and precision temperature control for temperature sensitive processes. This makes TEGAL 701 an ideal choice for reliable and accurate etching. In addition to its etching capabilities, 701 also features a built-in automatic pressure control unit, enabling greater accuracy in vacuum operations. An automated wafer handling machine allows for easy precise wafer and die positioning processes. The etcher is also equipped with an advanced temperature sensor which accurately monitors all temperatures during etching. The tool is also designed for low particle count operation, ensuring clean and contamination-free environments. The software interface of TEGAL 701 allows for easy setup and operation, with all the necessary parameters for etching, including power, pressure and flow rate, being easily set. The unit also features a vacuum gauge for monitoring the level of vacuum while etching. Overall, 701 is a powerful and reliable etcher, designed for precision use in a wide range of processing tasks. With its advanced etching capabilities, simple operation and built-in temperature and pressure monitoring, the asset is ideal for any situation that requires precision etching of silicon and compound semiconductor wafers.
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