Used TEGAL 900ACS #293635732 for sale

TEGAL 900ACS is an etcher/asher designed for substrate processing offering superior etch/ash performance in a variety of semiconductor and non-semiconductor materials. This etcher/asher utilizes TEGAL unique RF/DC power delivery technology, enabling high throughput and accurate process results. 900ACS offers several options that allow the user to customize their etching/ashing process and improve yield. The etcher/asher utilizes a three-step process: pre-clean, etch/ash, and post-clean. In the pre-clean step, the user can choose to pump the chamber out using a mechanical pump and then fill the chamber back up with a clean gas, usually an inert gas like nitrogen, to help reduce particles from entering the chamber. This step can optionally include other cleaning techniques, such as RF plasma cleaning. The second step is the etch/ash scenario. The user is able to customize the process by using either RF or DC power, depending on the materials being processed. The user is also able to adjust the power level, pressure, and gas flows to achieve the desired etch/ash depth. As the etch/ash process happens, exhaust gases will exit TEGAL 900ACS chamber to prevent contamination of the wafer. The third and final step is the post-clean process. For this step, the chamber is either pumped out mechanically, or filled with a clean gas to help reduce particles from entering the chamber. Any remaining etch/ash residues are then removed, either by wet or dry cleaning. 900ACS offers superior etch/ash performance in a variety of materials, making it well-suited for a wide range of applications. Its advanced RF/DC power delivery technology and customizable settings ensure accurate and repeatable processes, and its pre-clean, etch/ash and post-clean cycle allows for effective residue removal.