Used TEGAL 901 #9226737 for sale

TEGAL 901
Manufacturer
TEGAL
Model
901
ID: 9226737
Wafer Size: 6"
Vintage: 1990
Nitride etcher, 6" Missing parts 1990 vintage.
TEGAL 901 is a highly advanced semiconductor etching equipment that has been designed to provide reliable high-precision results with superior quality. 901 is built for production of integrated circuits and is perfect for advanced research laboratories and semiconductor and IC fabrication processes. TEGAL 901 is a single-system etching unit that is capable of a wide range of etch tasks, including metal etch, deep etch, MEMS etch, and more. It features advanced control systems and sophisticated wafer processing technologies to optimize the process and provide perfect results without sacrificing quality. 901 features a 200 mm vertical etching chamber with a 6-way mirror. This design allows for a uniform etching process across the entire wafer, and the 6-way mirror enables more precise etching. Additionally, TEGAL 901 is designed to maximize etching efficiency and throughput with its multi-targeting capability. 901 also features advanced wafer handling capabilities. It offers fully automated loading, unloading, transfer and reject management for up to 200 mm wafers. This ensures consistent and high-precision results without delays. Its advanced wafer handling machine also includes a multi-position vacuum arm for precise automatic wafer loading and unloading. TEGAL 901 is built for sophisticated IC fabrication, and its sophisticated software and hardware deliver the best in advanced wafer processing options. Its software tool features multi-task programming and monitoring capability, enabling users to easily program and monitor their process for accurate results. Its advanced software also includes automatic recipe selection for complex processes, allowing users to select from a range of recipes and reduce the need for manual operation. 901 is a superior etching asset that ensures reliable and accurate results, and is ideal for IC manufacturing and advanced research and development. Its advanced design and capabilities enable users to achieve the highest-precision etch results and maximize throughput.
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