Used TEGAL 901 #9250123 for sale

TEGAL 901
Manufacturer
TEGAL
Model
901
ID: 9250123
Wafer Size: 6"
Vintage: 1990
Nitride etcher, 6" Missing parts 1990 vintage.
TEGAL 901 is an etcher/asher, designed for use in semiconductor manufacturing processes. It is capable of delivering temperatures of up to 550°C in order to etch or asher materials. Additionally, 901 has an integrated temperature controller that can regulate temperatures between room temperature and the maximum of 550°C. This ensures an even temperature distribution and prevents any undue heating of the substrate. TEGAL 901 is equipped with several advanced features, designed for optimised etching/ashing performance. These include RFF (Radio Frequency Field) bombardment, which assists in ensuring uniformity across the sample. Additionally, 901 features vacuum capabilities, allowing for improved processing speed, and higher levels of precision and control. TEGAL 901 uses a combination of wet and dry etching techniques, utilising a hydrofluoric acid and buffered oxide etching solution. This combination allows for multiple levels of etching to be achieved, and higher levels of etching precision. Additionally, 901 uses a dry etching process that employs an etching gas, such as chlorine trifluoride, which minimises surface damage and increases etching efficiency. TEGAL 901 features several safety features, designed to protect operators from harm. These features include an enclosed processing chamber, which is equipped with sensors that activate if unsafe levels of pressure, temperature, or gas concentration are detected. Additionally, 901 is armed with a temperature and pressure cutoff system, to automatically shut off processing if unsafe conditions are detected. In conclusion, TEGAL 901 is a high quality etcher/asher, designed specifically for use in semiconductor manufacturing processes. Its advanced features, such as RFF bombardment and dry etching technique, deliver optimised performance, while its safety features protect operators from harm. 901 is a reliable and efficient tool for etching materials with precise and controlled results.
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