Used TEGAL 901ACS #9395520 for sale

Manufacturer
TEGAL
Model
901ACS
ID: 9395520
Wafer Size: 6"
Vintage: 2018
Reactive Ion Etcher (RIE), 6" 2018 vintage.
TEGAL 901ACS etch/ash is an advanced etching equipment with superior capabilities. It features a self-containment feature that reduces the risk of contamination, and a single-wafer batch process that allows for greater throughput and cost savings. The system has a mechanical and electrical design that provide precise and consistent operations, and it has a process controller with a user-friendly interface that allows easy access to the unit settings and parameters. 901ACS etcher comes standard with two process gases: SF6 and chlorine. The chlorine gas is used to etch silicon wafers while the SF6 gas is used to remove surface contaminants which are created during etching. Additionally, the machine can handle a wide range of wafer sizes ranging from 100mm to 300mm. The wafer size is detected automatically and the process parameters are adjusted accordingly. TEGAL 901ACS has a large chamber with a capacity of up to 12 wafers that can be processed at the same time. The tool also has an automatic cooldown feature, ensuring that the chamber environment remains at a safe temperature. This also helps to keep the process parameters consistent. 901ACS utilizes a dual-frequency AC power supply for precise process control, allowing for reproducibility in results. Furthermore, the asset is equipped with several safety features such as overvoltage and overcurrent protection and ground detection. The model also has a modular design that makes it easy to upgrade and extend the capabilities of the equipment. TEGAL 901 ACS etcher/ashers features a variety of process options that are tailored to meet the requirements of many applications. Its robust design makes it suitable for high-volume production and its ease of use makes it ideal for low-volume labs. Its accuracy and flexibility make it the perfect solution for applications that require precise etching parameters.
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