Used TEGAL 901B #9262409 for sale

TEGAL 901B etcher/asher is a high performance, heavy duty equipment that is designed to provide superior processing results for a variety of high volume applications. It is equipped with advanced features that offer superior performance and superior results for etching and ashing high-density, high-volume substrates. 901B offers advanced processing capabilities with its thick 7-inch (18 cm) quartz alloy chamber and dual 10-inch (25 cm) alloy surface etchers that are designed to handle large surface areas up to 7 x 8.5 inches (18 x 22 cm). It also includes a high-resolution filter-plus-optic design that gives users higher resolutions of up to 1 micron (0.001 mm). TEGAL 901B's robust design provides a high speed of up to 38 fpm (67.3 cm/s) and ensures it to be the ideal system for processing large substrates with the famous etch-film technology. It also features on-board Distributed Computing Technology (DCT) which helps to maximize etching speed and efficiency and also wafer-to-die or enclosure-filter compatibility. 901B achieves superior etching and ashing results due to its advanced electron cyclotron resonance (ECR) gas plasma technology. It is capable of etching and ashing with both reactive gas and non-reactive gas modes. Moreover, it can also be used for annealing and sputter etching thanks to its precision ICR(Ion Cyclotron Resonance) option. TEGAL 901B includes a range of user-friendly features, such as an intuitive user interface, multi-level access control, and option for Remote Control Centre (RCC) server integration to ensure consistent performance, quality, and safety. It also comes with an IBM-compatible PC control unit and an EDX (electron-dispersing X-ray) visual metrology machine to ensure accuracy and precision of the etching and ashing results. Overall, 901B is a reliable and versatile etcher/asher tool that offers superior etching, ashing, and annealing results of large substrates. Its advanced features, coupled with the flexibility and intuitive user interface, make it an ideal asset for high-volume production applications, as well as research and development processes.