Used TEGAL 901e /903e TTW, #12388 for sale
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ID: 12388
Wafer Size: 3" - 6"
Poly/Nitride or Oxide Plasma etcher, cassette to cassette, 3"-6", Through-the-Wall systems.
TEGAL 901e/903e Thin Film Wafer (TFW) etcher/asher is a high-performance system designed for advanced process control and superior wafer throughput. It is capable of high speed and smoothly managed production throughput, ensuring a flawless process for critically challenging structures. This versatile etcher/asher incorporates a wide range of process variables, such as etching precursors, gases, and pressure monitors, for a highly-flexible, reliable and reproducible driller. The SF 1000 micro-processing technology of TEGAL 901e/903e is engineered to support manufacturing advancements with precision adaptability. The automatic dual-stage etcher is designed to rapidly and effectively deliver superior etching accuracy, uniformity, and overall yield. The repeatable precision-edge maintains the near-perfect masking resulting in reduced damage on the substrate. The integrated sidewall profiling capabilities enable intuitive and tailored process control to achieve the desired etch characteristics and results. TEGAL 901e/903e offers easy-to-use roll-out capability. The intuitive user interface enables simplified startup and shutdown with programmable process recipes and steps. To ensure constant quality, the process tracking feature provides accurate and convenient step-by-step traceability. Live data analysis enables an operator to adjust parameters according to the wafer characteristics and responses. To facilitate flexibility and versatility, the 901e/903e is compatible with an array of TEGAL process precursors and THP compatible gases, including chlorine, nitrogen trifluoride, and oxygen-enriched air. The TF 1440 wafer handler offers advanced robotic wafer manipulation capabilities and is compliant with TEGAL process preservatives (Suffix "T"). TEGAL 901e/903e TFW etcher/asher is ideal for high-volume production in the semi-conductor industry, providing reliable and accurate surface cleaning and etching of contact holes, fan-outs, and metal depositions. This etcher/asher has the potential to provide superior throughput with uncompromised product quality.
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