Used TEGAL 903 #9210306 for sale

TEGAL 903 is a simple and low-cost etching / ashing equipment designed for production of high-quality metals and compounds. The system uses a low-pressure Modulated Chemical Vapor Deposition (CVD) process to produce high-purity metals, alloys, and intermetallic compounds. It features a process chamber temperature range of up to 1000°C, a substantial choice of gases, and pressure ranges up to 25 mbar. The etching/ashing process implemented by 903 is based on a combination of two important steps: the CVD formation of a protective film on the substrate of interest, and the ashing to remove unwanted residues from the substrate. The unit also provides the highest deposition rate available for CVD, as well as superior chemical purity compared to that of many other systems. Furthermore, the machine has been designed to take up very little space in a laboratory or production area. The low-pressure CVD tool of TEGAL 903 offers the highest deposition rates available, with a deposition rate of up to 6.5 nm/s and up to 30nm/min, depending on the materials and the process parameters. Moreover, the asset has a robust deposition uniformity of up to 99.95%, with a deposition accuracy of up to 0.02 micrometers. This coupled with excellent rate reproducibility makes it suitable for achieving excellent substrate surface quality and precise film deposition. 903 features a high-precision, fully-driven substrate holder capable of moving with high speeds of up to five-point-five millimeters per minute, as well as a protective chamber in order to reduce the generation of vibrations, minimize heat transfer to the substrate, and protect the model from ozone and dust particles. Furthermore, an additional vacuum line is connected to the outside of the safe working chamber to evacuate the excess gases and remove any unwanted particles from the etching/ashing process. TEGAL 903 also features a gas mixing unit, which allows for exact stoichiometric and non-stoichiometric ratios for the gaseous ingredients of the etching/ashing process. The unit is capable of supplying appropriate quantities of multiple gases in a single cycle, which can be controlled accurately according to the desired conditions and parameters. The driving mechanism is also air-cooled, to ensure stable and reliable operation. In conclusion, 903 is a low-cost, efficient, and reliable etching/ashing equipment with superior deposition rate, uniformity, and accuracy. Along with its ability to offer precise gas mixing, robust process control, and protection from external pollutants, the system is an ideal choice for scientists and engineers looking to produce high-quality metals and compounds.