Used TEGAL 903 #9265523 for sale
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TEGAL 903 is a 3rd generation etcher/asher, designed and manufactured by TEGAL Corporation. It is a two-spray equipment that combines chemical etching with chemical ashing to deliver a novel key process for wafer fabrication. 903 system offers the best of both worlds - precise alignment of each gas from the two-spray nozzle, and the flexibility of separately controlling multiple parameters for chemical etching and chemical ashing. These features allow for a wide range of process objectives, from time/temperature control to complex combinations of gases and components. TEGAL 903 is designed to provide reliable performance and high-speed throughput. It is capable of etching and ashing up to 2" (5 cm) wafers in as little as 15 seconds. Each etch/ash cycle can be dialed from 0.1 to 2.0ml, allowing the user to customize the degree of etch/ash processes. The unit can also be set to isobaric or statistical model etch/ash cycles for enhanced results. 903 is a high-performance machine, enhance with digital process controls, temperature and pressure sensors, total load checks, and programmable logic control systems. These features allow for full programmability and process automation. The tool also features a graphical user interface, providing access to over 256 preset recipes, enabling users to quickly recreate recipes used in previous installations. In terms of safety, TEGAL 903 is designed to conform with the strictest standards in the industry. It is equipped with over-pressurization protection, anti-static discharge devices, and arc-fault interlock systems. The asset is also compliant with all applicable UL, CSA, and IEC safety standards. To conclude, 903 is a robust and highly-configurable etcher/asher. Featuring a dual-process nozzle design, high-speed cycle times, programmable operating parameters, and an intuitive graphical user interface, TEGAL 903 is a powerful tool for wafer fabrication. With its outstanding accuracy, reliability, and safety features, 903 is the perfect choice for a wide range of processes.
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