Used TEGAL 903E #293766667 for sale

TEGAL 903E is an advanced etch / ashing tool designed for semiconductor, MEMS, and nanotechnology device fabrication. It is capable of multi-step reactive ion etching (RIE) and wet chemical etching (WCE) processes. The equipment is equipped with a high voltage power supply, plasma generator, and a long-life etching chamber. The powerful features of TEGAL 903 E enable advanced etching applications with critical aspect ratios, high aspect ratio etching, high-aspect ratio anisotropic wet etching and advanced doping techniques. 903E's vacuum chamber is rated for a maximum internal pressure of 1.5 mBar and has an overall chamber volume of 120 liters. It can accommodate up to 12 wafers simultaneously and it is equipped with a special DC/RF dual-mode plasma generator that provides precise control of the etching process. The system's gas delivery line can be used to in a wide range of etch processes, such as powder etching, reactive sputtering, chemical vapor deposition (CVD), and reactive ion etching (RIE). 903 E is designed for long-term use and reliability. The long-life chamber is made of an all-metal construction, which ensures superior etching results. The specially designed gas delivery line utilizes advanced technologies such as powder-injectors, valve controllers, multiple gas bottle slots, and safety/explosion-proof shutoff valves. TEGAL 903E offers built-in temperature control and precise end-point detection for precise process control. The unit is compatible with a wide range of wafer carriers, including stainless steel pallets and ceramic carrier wafers. The machine is also equipped with a high-precision etching control software, the TEGATEM, which can be used to fine-tune the etching process parameters. The tool is equipped with a secure and user-friendly safety asset and includes a variety of safety features, such as anti-bumpers, gas safety shutoff valves, remote control shutoff capabilities, and the ability to control the etcher from a remote location. TEGAL 903 E is designed to meet the requirements for specialized etching processes in complex MEMS and nanotechnology applications. It is an ideal tool for a wide range of etching needs.