Used TEGAL 915 #293766664 for sale

TEGAL 915 is an advanced plasma etcher / asher equipment manufactured by TEGAL Corporation. It is specifically designed for the etching and deposition of advanced thin-film dielectrics and electronic interconnects. 915 is a high-efficiency, high-precision system that offers excellent etching uniformity and high throughput for the high-volume production of thin-film circuits. It is designed with an innovative modular design that allows for easy installation, maintenance and reconfiguration of the unit for optimal process control. The machine also provides a range of programmable processes for efficient and repeatable etching. TEGAL 915 is equipped with an advanced etch chamber design, which is fed by two high-flow gas flow controllers, allowing the user to quickly adjust flow rates, pressures, and gas mixes in order to achieve optimal etching results. Furthermore, the chamber is equipped with an automated gas detection tool, which ensures accurate control of processing conditions. With its automated process control, the asset provides superior process repeatability and controlled over etch characteristics. The model utilizes a state-of-the-art plasma source for reliable, consistent and uniform etching of thin-film dielectrics and electronic interconnects. The plasma source is powered by a high-performance microwave generator to create an optimal temperature-resistant and efficient etch process. This ensures that the material is uniformly etched without damage or distortion. In addition, 915 is equipped with advanced multi-planar imaging systems to provide users with the ability to visualize the progress of etching processes. The equipment is also compatible with a wide range of film deposition materials, making it possible to create more complex and precise surfaces. Finally, the system is also equipped with powerful remote networking capabilities, which allows users to monitor, control and update the unit in real-time. TEGAL 915 is an advanced and versatile machine that provides superb process uniformity and excellent control of thin-film deposition processes. Its innovative design and powerful plasma source enable users to achieve precise and consistent results. Additionally, its advanced imaging systems and remote networking capabilities enable users to monitor and update the tool in real-time, providing the added flexibility and control necessary for the production of complex electronic interconnects.