Used TEGAL Chamber for 415 Plasma asher #293661204 for sale

TEGAL Chamber for 415 Plasma asher is an advanced etching / ashing technology used in semiconductor production and research. The 415 Plasma Asher enables rapid etching and ashing processes in an oxygen or process gas environment with precise temperature control. The chamber has a very small footprint and is designed for easy use. It has a stainless steel interior and a special Tungsten Interlocking Chamber chamber design for improved uniformity of process gas distribution. The chamber is equipped with state-of-the-art safety features, such as: safety interlocks, a dual-chamber pressure monitor and safety shutoff solenoid valves, to ensure safe operation. The chamber is equipped with a low-volume, peak, medium, and ultra-fast RF generator, which allows for a wide range of operating conditions. It provides highly accurate, repeatable etching and ashing results with low-flow rates up to 400 mmHg. The chamber's advanced motion control equipment ensures maximum process uniformity by accurately controlling the position of the sample. An Adaptive Controlled Permeable filter system helps maintain clean chamber surfaces and prevents charged particle contamination. TEGAL Plasma Asher has a large chamber capacity and can handle process plate sizes up to 244mm ( square or rectangular ). It also has a digital gas pressure control unit, which helps to limit airborne particle contamination and allows for a very precise etching process. The chamber is covered with a state-of-the-art heating machine, which provides rapid response to temperature changes. The 415 Plasma Asher is designed to provide consistent performance and repeatability by meeting customer-specific process parameters. It is easy to operate and maintain, and is designed to increase the productivity and reduce the cost when compared with existing etching / ashing technologies. It ensures high-quality wafers and maximizes yield. Its advanced safety features and motion control tool make it a reliable asset for etching and ashing processes.