Used TEGAL Plasmaline 200 #9141854 for sale

TEGAL Plasmaline 200 is an advanced, high precision etcher/asher equipped with a powerful RF generator and a large-capacity, load lock equipment. This machine is constructed to perform the widest range of etching processes with optimal results. The plasma generator on Plasmaline 200 produces high-temperature plasmas with a wide range of plasma energy levels and gas chemistries. The RF generator can be adjusted to allow improved control over the distribution of the plasma across the etch surface. This results in improved process reproducibility and reliability. The high-pressure chamber and load lock system lets users have a large feed rate capacity and provide a controllable atmosphere for the etching process. An optional vaporizer can be added for vapor phase etching. The vaporized species are delivered inside the etching chamber to perform dry etching processes with a high level of control. TEGAL Plasmaline 200's easy-to-use software provides users with process development capabilities, allowing for improved recipe optimization. The unit is equipped with real-time monitoring and data logging features for each etching process, as well as built-in wafer positioning with multiple etch head configurations. Plasmaline 200's advanced design makes it suitable for etching a wide range of materials including silicon, gallium nitride, gallium arsenide and other materials. The machine's automated skills help make production and measurement easy, while its high precision and process reproducibility make it suitable for advanced process development. In summary, TEGAL Plasmaline 200 is a powerful and versatile etcher / asher which utilizes a powerful RF generator and large-capacity load lock machine to guarantee high-precision etching with optimal results. The automated process control and monitoring features of the machine make it suitable for use in advanced process development applications.