Used TEGAL Plasmaline 200 #9142828 for sale

TEGAL Plasmaline 200 is an etcher / asher equipped with an innovative ionized physical etching technology and is designed for precise surface processing. It offers high precision, repeatability, and high speed processing, and is especially suitable for nanoscale and high-throughput applications. With a single-chamber design, Plasmaline 200 is easy to install and configure, with each of its components being accessible for easy maintenance. It features an advanced single-channel, single-beam source with high power reliability and low noise operation for optimal etching precision. The microstepping motor enables high accuracy and repeatability in material etching. The adjustable chamber construction maximizes the process yield with a range of substrates and industrial applications, promoting highly effective surface etching. TEGAL Plasmaline 200 etcher / asher utilizes high-performance plasma etching technology, engineered to achieve powerful, precise etching and controlled heat distribution. The electromagnetically generated plasma is evenly distributed to enable a perfectly uniform etching uniformly on any materials over the entire substrate. The etch rate of Plasmaline 200 is increased with the built-in quadruple injector technology, Ar+ gas, and a dedicated internal Faraday shield providing high plasma density with minimal particle contamination. With its open chamber design, TEGAL Plasmaline 200 allows for efficient surface area processing and predictable process performance, providing higher yields and increased throughput with minimal post-process white etching, no fuel/etch material re-deposition, and no residue deposition on the substrate during etching. The adjustable process parameters delivered by Plasmaline 200 comprises of adjustable gas flow rates, etch rate, and etchant concentration, resulting in reduced etching cycle time and an improved uniformity over larger surface area. Overall, TEGAL Plasmaline 200 is a high-tech, easy-to-use industrial etcher / asher for higher yields, improved throughput times, and reduced cycle times. It offers an innovative, single-beam source, multiple injectors, low noise operation, and adjustable process parameters, all powered by a powerful, precision, and repeatable technology. With its high performance and wide range of substrates and applications, Plasmaline 200 is ideal for nanoscale and high-throughput industrial etching operations.