Used TEL / TOKYO ELECTRON 300T #9194184 for sale

TEL / TOKYO ELECTRON 300T
ID: 9194184
Vintage: 2000
Sawing machine 2000 vintage.
TEL / TOKYO ELECTRON 300T is an etcher/asher equipment designed for advanced device fabrication. This system supports a wide range of process tools and chemistries to enable next-generation device integration. It uses a process-compatible etcher, asher, or litho-etch chamber and is capable of continuous operation in almost any environment. The unit is equipped with highly advanced control and automation systems to allow for optimal process recipe customization to meet customer needs. The versatile etch process of TEL 300T allows for a range of etching of thin film structures such as intermediate gate etch, deep recess etch, shallow trench isolation etch, and junction spacer etch. It also supports advanced cleaning modules with an integrated acid strip for complete removal of organic materials from the wafer. This machine employs a special set of hardware such as wand and power supply interfaces for user-defined etch and asher recipes. The advanced process control tool with auto-stabilization allows for highly precise etch and asher operations. TOKYO ELECTRON 300T is designed for unparalleled process flexibility and robustness in a single 30cm (12-inch) wafer-handling asset. It is equipped with a highly reliable auto-transfer for wafer transfer and a Near-field He (NH3) plasma asher by-product. The NH3 plasma glow monitor module allows for precise monitoring of the etch/asher process condition. Furthermore, the advanced process control model automatically adjusts the power and flow profile to ensure a consistent and repeatable etch process. The equipment is expandable for ultra-shallow junction processing including pocket and plug etching, BPSG planarization, and hydrogen annealing. It is also capable of forming oxide-free structures via short-time thermal processes. 300T is compatible with a variety of chemistries including Ar, NF3, SF6, CCl2F2, O2, and H2, depending on the process. The LINX recipe library allows for setting up optimal etch and clean conditions with minimal setup and test time. This library also contains a full line of safety information regarding each process and the resistance to corrosion. Furthermore, the TEM software package offers an extraction feature that allows for easy evaluation of key process metrics, including etch depth, anisotropy, etch rate, etch performance, and critical dimension uniformity. Overall, TEL / TOKYO ELECTRON 300T is a powerful and reliable etch and asher system designed for advanced device fabrication. It features a wide range of process tools, chemistries, and auto-stabilization features to ensure consistent and repeatable etch/asher operations and for optimal process recipe customization. The versatility of the unit also makes it suitable for many applications in today's device fabrication.
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