Used TEL / TOKYO ELECTRON 5K5499 #9148403 for sale

TEL / TOKYO ELECTRON 5K5499 is a highly advanced etcher / asher offers a cost-effective solution for process engineers. Featuring a fully-automated chamber, it can accommodate up to two 300mm/12" wafers for etching or ashing. The instrument combines precise temperature control and wide range of flow options with underlying proprietary PECVD/plasma source. The combination of advanced gas injection technologies and sophisticated hardware and software ensures the highest degree of process consistency. First, this asher/etcher offers a range of higher performance by providing enhanced precision automated controls. The instrument also is capable of automated management of up to two processes, allowing for optimal efficiency and higher yields. TEL 5K5499 offers a wide range of process options that can be customized based on the process engineer's requirements. These processes include etch, ash, CVD, and various other specialty processes. The highly automated system includes programmable gas, time, and temperature parameters. The temperature range is from 100 to 400°C, and the maximum flow rate is 600 sccm. This multi-purpose instrument also offers two modes of operation - a manual mode and an automatic mode for operation of multiple processes. Additionally, during processing, this instrument maintains the desired process conditions for the best process results. The instrument boasts an intelligent data management system which allows for easy operator interface and process monitoring. TOKYO ELECTRON 5K5499 runs by Windows operating systems and includes a 12.1" color LCD panel for displaying process data. The system also includes manual stand-alone software for intereactive process execution and control. The manual stand-alone software includes a wide range of features to monitor and manage process conditions. 5K5499 is designed to increase process efficiency, minimize scrap loss, and provide process stability and repeatability. It is equipped with a PECVD (plasma enhanced chemical vapor deposition) source to ensure the highest quality of etching and ashing results. The instrument runs by a proprietary user interface and offers comprehensive data management, process monitoring, and process control features. Because of the instrument's advanced features, it offers reliable and consistent results and can meet the needs of the most advanced process engineer.