Used TEL / TOKYO ELECTRON 8500PE #293759276 for sale

TEL / TOKYO ELECTRON 8500PE is an etcher/asher designed for semi-conductor and other micro-fabrication processes. It is based on an advanced ICP (inductively coupled plasma) source similar to those used in ICP-RIE (Reactive Ion Etching) systems, and utilizes both a wet and dry cleaning process. TEL 8500PE can be used to both clean and etch materials, from silicon, quartz and polysilicon, to gold and copper. It works by first cleaning the substrates to ensure a clean and contamination-free surface prior to processing. For cleaning, TOKYO ELECTRON 8500PE utilizes an Argon gas stream with added oxygen, producing an ICP source with programmable RF power. This high ionized plasma can clean a wafer in a shorter time with more uniform material removal. Additionally, 8500PE also features a dedicated dry etching process capability. The dry etch mode utilizes the same ICP source as the cleaning process, with the addition of a chlorine gas stream, specially tuned to the type of material being etched. With this enhanced RF source, TEL / TOKYO ELECTRON 8500PE is able to maintain a consistent etch rate and uniformity across multiple wafers. TEL 8500PE is integrated with TEL Contol software package, enabling users to program a variety of etch recipes. With the software, users can control all the settings, including process time, gas flow, ICP parameters, and wafer temperature. The Control software also allows TOKYO ELECTRON 8500PE to be connected to other devices in a LAN (local area network). This allows for data transfer between multiple 8500PEs, as well as with external databases or other computers. 8500PE has been available for more than a decade and is now used extensively in the semi-conductor and micro-fabrication industries, providing an economical and reliable etch and cleaning process. Whether used in a standalone system or integrated within a larger process machine, TEL / TOKYO ELECTRON 8500PE remains an essential tool in modern micro-fabrication.