Used TEL / TOKYO ELECTRON Certas #9311001 for sale

TEL / TOKYO ELECTRON Certas is an etcher/asher used in wafer processing. The device is a parallel-plate type substrate etcher and asher with optical-level precision for the processing of wafers up to 200 mm in diameter. It is designed to be used in a variety of etching and ashing processes. TEL Certas rotation stage is designed to support the wafer during processing with its symmetrical shape providing a uniform distribution of stress on the wafer. The rotation speed of this stage is adjustable from 5 rpm to 300 rpm. The stage can support substrates up to 5 kg in weight. The multiplate etch/ash chamber of this device is designed to provide effective plasma etching and ashing processes with a total of six plates. This allows for a greater variety of processes to be carried out within the same machine. The plasma generated in this chamber is efficiently transported to the wafer surface, providing a reliable etch rate and wafer cleaning. TOKYO ELECTRON Certas is also designed to enable a variety of process gases to be used in its operations. This feature allows the device to be used with a variety of different applications such as standard etching and cleaning processes, photoresist etching, and dielectric etching. The option to use both standard and novel process gases helps the operator to obtain optimum results from their wafer processing. The control panel of the device is designed to be operator-friendly, with easy to use functions and graphical user interface. This enables the operator to quickly and accurately set parameters for their process. The device also has a built-in fault detection system that triggers an alarm if an abnormal condition is detected. This helps the operator to quickly identify any problems that may have arisen during processing. In conclusion, Certas is an etcher/asher designed to offer precision, reliability, and versatility in wafer processing. With its adjustable rotation speed, multiplate chamber, and ability to process a variety of process gases, the device is suitable for a variety of applications. The device's operator-friendly control panel and built-in diagnostic systems make it easy to use, giving users confidence in the device's performance.