Used TEL / TOKYO ELECTRON Certas #9375198 for sale

TEL / TOKYO ELECTRON Certas is an advanced etching/asher instrument designed for high-precision through-hole lithography and etching of IC devices in the cleanroom environment. It is a fully automatic lithography/etcher equipment designed for extreme accuracy and reliability. Its integrated backside alignment feature and state-of-the-art optics enable it to perform highly precise lithography and etching processes, including micro formation, line formation, through-hole etching, and contact hole etching. Its advanced micro-lithography system makes sure to etch and print uniform patterns onto IC devices with high yield and quality. This state-of-the-art technology introduces new levels of fine precision lithography and etching and ensures repeatability and accuracy even for complex designs. The stable operation of TEL Certas is ensured by its fully automated process unit, which allows for its operation in extreme conditions. The automatic film loading and unloading machine keeps the cleanroom environment free from the risks of manual handling, further ensuring continuous and steady operation. Additionally, its process controlling tool acts as a self-adjusting feature that can easily handle any adjustments required by device design or process conditions. TOKYO ELECTRON Certas offers superior process flexibility due to its large process range. It is compatible with both i-line and KrF excimer lasers and can be easily programmed to handle any kind of pattern. The combination of advanced optics, advanced auto-focusing asset and highly accurate servo-motion control hold the promise of high performance and repeatability even with the most complex designs. Furthermore, its software-controlled laser spot profile adjusts automatically for the optimal firing of laser beams and precise etching. Certas is a highly integrated, versatile etching/asher model that promises precision, quality, reliability, and stability. By incorporating advanced features such as integrated backside alignment, nano-positioning equipment, high precision optics, auto-centering, and advanced process controlling protocols, it offers unmatched etching and lithography performance.