Used TEL / TOKYO ELECTRON Chamber for Tactras Vigus #9298663 for sale

TEL / TOKYO ELECTRON Chamber for Tactras Vigus (ETCHER/ASHER) is a state-of-the-art, batch-type etching equipment. The chamber is designed to precisely control the dimensions and shape of etched micro-structures, and it automated the entire process temperature, gas pressure, bath temperature, and various etching gas types can be remotely controlled. The Tactras Vigus chamber is suitable for: production of MEMS, wafers, SOI and Si, glass etching, various semiconductor process such as CMP and cleaning, and etching of high frequency circuit boards such as RF. Its temperature range is from -10 to 400 °C and the pressure range is from 0.1 to 600 mbar. The chamber is also equipped with Argon (Ar), Nitrogen (N2), Carbon dioxide (CO2), Hydrogen (H2) and other gases, to facilitate etching processes. The etching system is also equipped with advanced features such as: a back-side cooling unit, a temperature homogenization machine, a gas supply tool, an inert gas asset, a gas purging model, and a pre-programmed recipe function for pre-configured recipes to meet various process requirements. The chamber is certified by the Japan Industrial Standard (JIS) and is compliant with the following: Online Foul Gas Reduction (FGR)*, E-ferrite Argon gas FGR, and CVD**. It is also equipped with an FGR*** regeneration function, to reduce the amount of hazardous gasses produced during the etching process. Additionally, the chamber has pre-programmed settings for different gas combinations, to facilitate the etching process. In addition, the Tactras Vigus Chamber is approved for usage in semiconductor and electronics industries, and comes with a 1-year warranty. Its design makes it easy to operate and maintain, with a user-friendly LCD panel and a convenient control panel. It is capable of etching a large variety of materials, making it a versatile device for a range of etching applications. Overall, TEL Chamber for Tactras Vigus is an advanced etching equipment that provides reliable performance and precise etching results. With its user-friendly features and a wide range of support gas types, it is suited for various etching processes. * FGR - Foul Gas Removal ** CVD - Chemical Vapor Deposition *** FGR - Foul Gas Remediation