Used TEL / TOKYO ELECTRON Chamber for Trias #293650087 for sale

TEL / TOKYO ELECTRON Chamber for Trias is an etcher/asher featuring a three-step wet etching process for superior etching accuracy. This specialized equipment is capable of etching small features on thin films quickly, with minimal waste and damage to the substrate. It is well-suited for various semiconductor, MEMs, and nano device applications where critical performance and minimal substrate damage is required. TEL trias etcher/asher is specifically designed to process multiple thin films at once, with simultaneous plasma etch, wet etch, and wet clean—what TOKYO ELECTRON calls "predictive patterning". This process ensures that all features etched are evenly sourced and have consistent widths and depths. Additionally, the patented three-step process allows for less critical features to be over-etched, resulting in cost savings and minimal waste. The chamber itself comprises of two RF generators that are incorporated in an undivided chamber with an etching window, which can be adjusted to selectively etch different layers. A double-sided wafer handling system is used to move the wafers within the process chamber, preventing contamination. The wafer is first treated with a plasma etch using an RF etch technique, then transferred to the wet etch step, and lastly to the wet clean. The advantages of TEL / TOKYO ELECTRON trias etcher/asher extend beyond its fast process rate. The chamber minimizes defectivity and damage to the substrate due to the gentle plasma etch process. Additionally, contact time with etchants can be shortened and throughput can be maximized with process repeatability achieved on all substrate sizes. TEL trias etcher/asher is specifically designed for advanced semiconductor, MEMs, and nano device processing and is a reliable, straightforward piece of processing equipment for all advanced etch requirements. It's capability to move, over-etch, and clean in a single step, combined with it's excellent repeatability and accuracy makes it a valuable asset in any dry etching process.