Used TEL / TOKYO ELECTRON DRM #293616604 for sale

TEL / TOKYO ELECTRON DRM
ID: 293616604
Wafer Size: 8'
Vintage: 1999
Etcher, 8" 1999 vintage.
TEL / TOKYO ELECTRON DRM is an etching machine that is used to transfer patterns onto a substrate. This machine operates by blasting a silicon wafer (or other material) with a beam of charged particles, such as ions, in order to create the desired patterns on the wafer surface. These ions hold energy and if the energy of this beam is sufficiently low, the ions will not create any damage to the material at the same time. This machine is also known as a photoresist asher or a dry etcher as its etching mechanism involves using ions instead of chemicals in the etching process. This method of etching allows for much faster etching with less debris (as no liquid chemical is used) and can produce patterns with much finer detail than can be achieved with a liquid etch. TEL DRM utilizes a plasma-assisted etching process for greater accuracy. In this process, a neutral gas (typically a mixture of helium and oxygen) is introduced into the chamber of the machine and then a high voltage is applied between two electrodes. The electric field between the two electrodes causes the gas to become charged and form a plasma. The individual gas molecules ions in the plasma collide with the surface of the wafer while keeping their energy lattice intact, thus avoiding any damage to the wafer. The beam of ions may be focused in specific areas and with this beam, the machine stores a library of millions of different etching patterns that are used during etching process. In addition, during the etching process, the machine may be controlled with external voltage, which will change the net energy of the plasma and could provide additional control and accuracy for the etching process. TOKYO ELECTRON DRM is a highly precise and reliable machine, capable of creating extremely low line widths, and high resolution patterns. This machine can achieve a high quality end-result with minimal maintenance and can be used on a wide range of materials. It is a popular and effective choice for thin film etching in a variety of industries.
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