Used TEL / TOKYO ELECTRON Etch chamber for Certas RST #293671309 for sale

TEL / TOKYO ELECTRON Etch chamber for Certas RST is a highly advanced and reliable etching and ashing system for the manufacture of integrated circuit components and substrates. This etch chamber is capable of performing a wide variety of process tasks, from etching of aluminum interconnects, to ashing of photoresist, to annealing of certain materials. TEL Etch chamber is precision built and offers the highest levels of reliability and repeatability. The chamber employs advanced features such as high-precision RF generators, dual-zone RF electrodes, and integrated temperature control, allowing to it to achieve the tightest process tolerances. In addition to the robust and reliable functionality of the etch chamber, it is designed with easy to use controls and software. This makes for a straightforward user experience; etch chamber parameters can be quickly stored, retrieved, and edited for easy operation. TOKYO ELECTRON Etch chamber is designed to be an efficient and productive tool. The chamber features a tri-mode wafer transfer mechanism that allows for low-pressure loading and unloading of wafers at extremely high throughput speeds. Furthermore, advanced plotting capabilities are incorporated into the bed of the etch chamber which allows operators to design and draw templates used for etching and plasma ashing. TEL / TOKYO ELECTRON Etch chamber is an extremely powerful and versatile tool for handling a large variety of process applications. Its precision construction and easy to use controls make it suitable for use in a wide range of etching and ashing applications, like MEMS fabrication, plasma ashing, polyimide removal, and more. This etch chamber has been designed with safety in mind. It features a variety of safety features such as multiple pressure and temperature sensors, as well as well-shielded RF electronics to keep operators and personnel out of harm's way while the chamber is in operation. TEL Etch chamber for Certas RST is a reliable and advanced etching and ashing system that is capable of meeting the tightest process tolerances and achieving the highest throughput speeds. Featuring an easy-to-use interface, robust construction, and safety features, this etch chamber is sure to meet the needs of any IC fabrication or device manufacturing operation.