Used TEL / TOKYO ELECTRON Formula-1S-H #293647205 for sale

TEL / TOKYO ELECTRON Formula-1S-H is an etcher / asher equipment specifically designed for semiconductor processing. TEL Formula-1S-H is a direct heating type etcher/ asher unit equipped with a unique TEL original Pulsed CO2 laser system. The high output and highly efficient laser ensures that the etching rate is high and the crystal damage is minimal. TOKYO ELECTRON Formula-1S-H also features a high-precision temperature control system, which not only ensures uniform deposition of thin films onto the substrate, but also eliminates non-uniform heat transfer and ensures a consistent etching result. Formula-1S-H also features advanced temperature control and chamber design, ensuring accurate and consistent annealing and etching processes. The temperature of the annealing and etching processes can be precisely adjusted and the chamber design minimizes thermal transfer, allowing for efficient annealing and etching processes. The temperature range can easily be adjusted and the chamber height can be adjusted to the optimal etching height. TEL / TOKYO ELECTRON Formula-1S-H also features a dedicated CO2 laser system with a range of laser parameters and laser power settings, allowing users to optimize the process for their desired application. The laser parameters are adjustable depending on the application, allowing users to achieve precise etching characteristics. The adjustable laser settings ensure that the etching process can be optimized to achieve a precise etching depth and depth profile. TEL Formula-1S-H also features a patented CVD layer growth technology, allowing for the precise formation of thin layers. The CVD layer growth technology is a one-step process that reduces the amount of processing time, increases throughput, and reduces the number of process steps. The CVD layer growth technology is compatible with many different materials such as III-V compounds, lithium niobate and boron nitride materials. Overall, TOKYO ELECTRON Formula-1S-H is an advanced etcher/ asher equipment specifically designed for semiconductor processing. The high output and highly efficient laser ensures that the etching rate is high and offers precise temperature control and chamber design, allowing users to achieve uniform deposition of thin films. The adjustable laser settings ensure that the etching process can be optimized to achieve precise etching characteristics and CVD layer growth technology provides one-step processing to reduce processing time and increase throughput.