Used TEL / TOKYO ELECTRON Formula-1S-H #293654963 for sale

TEL / TOKYO ELECTRON Formula-1S-H is an etcher/asher designed for applications where a quick, precise and fine etching process is required. The equipment uses a combination of a plasma source, etching gas, controlled power and high frequency (RF) electric power to create a perfect etch profile. The etching process starts by ensuring a clean and exactly planar substrate. This is done to ensure that the etching process yields uniform etching results in the substrate. Next, the etching gas is injected into the system chamber, which is separated from the substrate by an independent RF antenna section. The unit then applies RF energy to the chamber, creating a plasma consisting of charged particles and reactive species that interact with the substrate. The rate of etching is then controlled by a combination of parameters such as the etching area, the flow rate of the etching gas and the power intensity. TEL Formula-1S-H is equipped with a precision etch chamber that is suitable for etching high aspect ratio (HAR) structures while also guaranteeing a low vertical erosion profile. This makes it possible to define even the most complicated three-dimensional structures with a high level of accuracy. In addition, the machine has a variety of user-friendly features, such as automatic wafer recognition, an on-board chemical management tool, condensed chemistry maintenance and an assisted procedure guide. TOKYO ELECTRON Formula-1S-H has a high throughput rate, allowing it to produce high-quality etch results in a relatively short process time. The asset is also designed to be reliable since it has been designed to withstand high-power RF fields and extreme temperatures. All of these features make it an ideal choice for etching applications that require quick and precision etchings.