Used TEL / TOKYO ELECTRON Formula-1S-H #293744363 for sale

TEL / TOKYO ELECTRON Formula-1S-H
ID: 293744363
Wafer Size: 12"
Vintage: 2005
Diffusion furnace, 12" 2005 vintage.
TEL / TOKYO ELECTRON Formula-1S-H is an etching/asher equipment that is designed to enable users to etch and ash semiconductor materials for fabrication of integrated circuits, thin films, microelectromechanical devices, and related products. The system works through an evaporation/condensation process that conforms to the surface of the substrates. It is designed to handle a variety of different substrate types and materials, including silicon wafers, glass slides, metal substrates, and exotic semiconductor alloys. TEL Formula-1S-H features a vacuum chamber, which seals in the evacuating gas and ensures that the environment is maintained to a temperature range of between -50 and +150°C. The vacuum chamber uses a built-in heater that warms up the substrate material of choice before the etching process begins. TOKYO ELECTRON Formula-1S-H features a Thermal Desorption Unit (TDU) as its main component. This unit contains both a high-frequency etching unit and a low-frequency etching machine, which allows users to etch and ash more specific materials according to their application. The TDU also features an adjustable temperature of up to 300°C for high-precision etchings of delicate substrates. Formula-1S-H also features a Post Etch Analysis tool. This asset tracks the thickness of the substrate material as it is etched and provides feedback on the precision of the etch. Additionally, it can provide information on the uniformity of the etching process. Finally, TEL / TOKYO ELECTRON Formula-1S-H has a deep UV optical absorber mode, which enables users to measure the homogeneity of the substrate material on the atomic level. This provides accuracy and confidence when etching and ashing delicate materials. In conclusion, TEL Formula-1S-H is an advanced etching/asher model designed to accommodate a variety of different substrate materials. Its features, such as the TDU, PEA, and deep UV optical absorber equipment, ensure accuracy, precision, and uniformity when etching and ashing delicate materials.
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