Used TEL / TOKYO ELECTRON Formula ALD High-K #9263878 for sale

TEL / TOKYO ELECTRON Formula ALD High-K (or FormulAlD) is an advanced etcher/asher designed for semiconductor fabrication processes. The product is a batch-level, self-contained equipment capable of delivering advanced etching and ashing capabilities to meet advanced semiconductor lithography production needs. The FormulAlD system features an optimized dual chamber architecture that includes a patented, modulated dry etch chamber and a superior performance etch chamber. The dry etch chamber allows for the highest etch rate possible while minimizing contaminate deposition. The chamber utilizes a patented dual bias technology that combines three independent frequency-controlled high frequency pulses in each cycle to provide an unprecedented etch rate on a wide variety of materials. The first pulse is used as a pre-cleaning process and the second and third pulses offer precise, repeatable etching with minimal backing on the etched surface. The chamber includes a TEL-installed etch monitor with real-time monitoring and recipe tracking capabilities. The second chamber is the advanced ashing chamber which is optimized for ashing advanced metal and insulator materials. Utilizing a three-stage process that includes a rapid ramp-up of temperatures, a two-step heat-up, and a rapid cooling process, the asher is capable of etch rates of up to 2000 nm/min. The chamber also utilizes a non-invasive direct pyrometry unit that constantly monitors the temperatures of the wafer during the ashing process. This process ensures a uniform ashing profile with no variations in surface topography. In addition to the dual-chamber architecture, the FormulAlD machine also features numerous technologies, such as optional plasma recycle circuitry and a sub-2 µm particle size control. The particle size control set-point is adjustable and coupled with a 3-micron in-situ cleaning tool, the asset is capable of extreme low contamination levels. Additionally, the model also features an optional integrated resist strip channel for post-etch control of the wafer surface. The FormulAlD equipment is the only advanced etcher/asher of its kind available on the market. The system is capable of performing advanced etching and ashing of a variety of materials to meet the most stringent geometry requirements and is ideal for high-volume production lines. The unit has been tested and proven in multiple applications and offers reliable performance as well as improved productivity.