Used TEL / TOKYO ELECTRON Formula ALD High-K #9263885 for sale

TEL / TOKYO ELECTRON Formula ALD High-K is a reactive ion etcher / asher designed to fabricate advanced devices of silicon and other substrates in the semiconductor industry. Equipped with a high-precision, state-of-the-art plasma source, the tool allows for the precise etching or ashing of extremely thin layers (down to 1nm) in both planar and 3-dimensional structures. The system also features advanced equipment enhancements specifically designed to reduce the process time of the etching or ashing process while still maintaining a maximum level of precision. For instance, it is equipped with a high-frequency pulse source, as well as improved gas systems for optimal etching and ashing performance. In addition, its unique TEL Formula ALD High-K technology enables greater control of plasma characteristics and accuracy of etching rates. As such, this allows for the reproduction of high-level etching and ashing patterns with repeatability and uniformity. Furthermore, TOKYO ELECTRON Formula ALD High-K supports the use of various gases, such as some fluorinated gases, for highly specialized etching and ashing processes. It also has features that enable it to fabricate a wide range of material layers (between 1 and 25nm in thickness) with superior levels of cleanliness and accuracy. In addition, the system is compatible with a variety of substrates, including silicides, oxides, and high-K dielectrics. When used with appropriate safety measures and specialist knowledge, Formula ALD High-K can provide a reliable etching and ashing process capable of fabricating high-performance, advanced devices from silicon and other substrates. As such, it is an invaluable tool for semiconductor companies.