Used TEL / TOKYO ELECTRON Formula ALD High-K #9283434 for sale

TEL / TOKYO ELECTRON Formula ALD High-K etcher/asher is an advanced, computer-controlled etching equipment used for fabrication of semiconductors, MEMS and other nanodevices. The system utilizes Atomic Layer Deposition (ALD) technology to enable the precise control of resistant and/or etchable materials during the etching process. TEL Formula ALD High-K unit is equipped with two chambers: one for plasma etching, and one for plasma ashing. The machine performs both methods in a single chamber, with a single wafer transfer tool. The asset has an upper and lower inductive RF source, providing uniform heating and a low-power source that can be used for etching or ashing. It also includes a range of customizable parameters to match process recipes. The model can handle a variety of resist and etchable material types, including SiO2, SiN, Si, AlOx, dielectric/semi-conducting/polymeric/conducting dielectric/metals, and other materials. The software-programmable etching power, pressure, and process time allow users to select optimal conditions from a wide range of recipes. TOKYO ELECTRON Formula ALD High-K etcher/asher has the capability for in-situ cleaning, allowing for continuous production and higher throughput. Additionally, the equipment has proven successful in achieving smooth and uniform etching/ashing performance on wafers. This advanced system is capable of processing numerous wafers in parallel, with precise control of etch/ash parameters and resist strip. The unit's high-throughput, uniformity, and precise etch/ash control make it an ideal tool for semiconductor manufacturing, MEMS fabrication and other nanodevice processing. With its precise etching and ashing control, Formula ALD High-K etcher/asher is the top choice for any nanotechnology/nanofabrication laboratory.