Used TEL / TOKYO ELECTRON Formula #293596091 for sale

TEL / TOKYO ELECTRON Formula ("TEL Formula") is a powerful etching and ashing machine used in the semiconductor industry for removing and cleaning semiconductor substrates. It is capable of delivering high-quality, uniform etching results. TOKYO ELECTRON Formula is designed to provide the highest level of accuracy and efficiency in the production of high-complexity, advanced circuit designs. The core of the etcher is a precision, high-speed spindle motor, and a large-diameter, high-speed abrasive wheel that rotates at a high rate of speed. This allows for the very precise removal of materials from the semiconductor surface, ensuring uniformity in the result. Formula etcher also features an integrated vacuum equipment that eliminates dust and debris generated during the etching process, helping to ensure optimal performance. TEL / TOKYO ELECTRON Formula etcher utilizes a unique and patented process known as Photonic Discharge Electron Lithography (PDEL) to etch and clean the semiconductor substrate. PDEL is an advanced etching technique that uses a high-power, ultra-violet laser to generate a bubble of high-intensity electrons that etches away material from the substrate in a highly uniform manner. By using this advanced etching technique, TEL Formula etcher can quickly and precisely produce a wide range of advanced circuit designs. TOKYO ELECTRON Formula etcher also features an intelligent and comprehensive control system, which allows the user to adjust the etching parameters such as chamber pressure and temperature, substrate power, and laser power. This helps ensure optimal results for any specific application and allows for greater flexibility when adjusting etching parameters. The unit also has a built-in memory that stores and logs each etching condition, providing a detailed view of the etch process. In conclusion, Formula is an advanced etcher and cleaner used in the semiconductor industry. The etcher utilizes an innovative and precise PDEL etching technique, and its intelligent control machine enables users to customize etching parameters to deliver high-quality, uniform etching results. Additionally, the machine's integrated vacuum tool prevents dust and debris from contaminating the semiconductor substrate and ensures optimal performance.