Used TEL / TOKYO ELECTRON Formula #293596097 for sale

TEL / TOKYO ELECTRON Formula
ID: 293596097
Furnace Process: ALD High-K.
TEL / TOKYO ELECTRON Formula is an innovative etcher/asher designed for various device fabrication processes in the semiconductor industry. It is comprised of a main etcher/asher chamber, vacuum pump, and system controller unit. TEL Formula etcher/asher utilizes high-frequency loads, power supplies, and high-frequency amplifiers to create and apply etch/ash processes to a wide variety of materials such as silicon, gallium arsenide, graphene, and others. The main chamber of TOKYO ELECTRON Formula is spacious, allowing for more space to freely enter and exit the helium-ion powered chamber. Additionally, the system controller unit provides excellent control over the process parameters, including etch/ash rates, pressure, temperature, and other parameters. The etch/ash process is enabled within Formula via adsorbed protons or neutrons which generate a high-density ion plasma that is used to etch or ash substrate materials. This plasma is formed through a series of magnetic fields and radio frequency (RF) waves, which subject the etch/ash chamber to a kind of ion bombardment. This bombardment dissociates the molecules of the substrate material and thereby forms a uniform etch or ash pattern across the wafer. TEL / TOKYO ELECTRON Formula is an ideal solution for various fabrication processes due to its excellent etch/ash rates, flexible chamber handling, and comparatively reasonable costs. It is able to etch/ash substrates at a rate of up to 1,000 mm/min, and similarly, it is able to ash up to 500 nm/min. This allows for more precise and intricate fabrication processes. Furthermore, the chamber provides reliable handling of various materials, ranging from outgassing resins, photoresists, and quartz.Finally, TEL Formula etcher/asher is competitively priced, making it a viable solution for many semiconductor fabrication processes. In conclusion, TOKYO ELECTRON Formula etcher/asher is a reliable and high-performing device for various semiconductor fabrication processes. It is equipped with state-of-the-art components and processes that deliver precise, accurate and highly repeatable etch/ash patterns. This, combined with its affordable price tag, makes it a great choice for many processes.
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