Used TEL / TOKYO ELECTRON Formula #9098194 for sale

TEL / TOKYO ELECTRON Formula is a highly sophisticated etcher and asher used in the field of semiconductor fabrication. It is a single-wafer system designed for deposition and etch processes and can be used for a wide variety of steps in semiconductor fabrication, including thin film deposition, etch, or chemical-mechanical polishing. The unique design of this etcher/asher offers fast process times, higher throughput, and improved process uniformity. TEL Formula utilized a variety of plasma sources to etch and shape the materials. This etcher/asher features both vacuum and high-pressure process chambers. The vacuum chamber is used for performing etch, thin film deposition, or CMP processes. The high-pressure chamber is utilized for increased productivity and yielding higher quality interfaces with the substrate. The innovative design of TOKYO ELECTRON Formula is based on a dual-frequency RF generator and short-pulse, high-frequency RF generator that supply high and low powers, respectively. The main advantage of this design is that it allows for higher etch rates as well as better surface uniformity. In addition, the dual-frequency generator also enables faster process times and improved process control. The advanced design of Formula also enables the use of lower temperatures, allowing for improved materials compatibility and increased process flexibility. This technology allows for the use of advanced materials and high-performance film deposition processes as well as superior etch selectivity. In addition, TEL / TOKYO ELECTRON Formula also features global incident frequency control for optimised etching performance and improved process control. The overall performance of TEL Formula is highly impressive. This etcher/asher offers excellent process repeatability, high throughput, and superior etch rates, making it an attractive choice for a wide range of semiconductor fabrication processes. Additionally, the advanced design allows for much faster processing times as well as improved process control, allowing fabricators to achieve higher yields and precise process control.