Used TEL / TOKYO ELECTRON Formula #9195346 for sale
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ID: 9195346
Wafer Size: 12"
Vintage: 2010
Vertical diffusion furnace, 12"
Main computer: Windows
Operating system: LINUX
Main body
Power box
Power box plate
EXH Box
Gas box
(2) Flow boxes
Load port
(2) I/O Units
I/O Top cover
I/O Filter
(7) Parts boxes
(4) Cable boxes
2010 vintage.
TEL / TOKYO ELECTRON Formula is an etcher (commonly referred to as an asher) which can be used to etch or engrave semiconductor patterns and other materials. It does this using a combination of laser, UV, and chemical etching techniques. The device uses a precise beam of particles from an electron gun to create the desired etching patterns. This beam is emitted from a small aperture and the pattern is determined by the voltage of the electrodes. TEL Formula etching process relies on a number of different elements including lasers, etchants, and cleaning solutions. The laser is used to create the initial pattern which is then tested and modified on the test structure. Etchant solutions and gases are then used to shape the pattern, as well as clean the substrate after the etching is complete. The device features a holder arm which holds the wafer or other substrate in place for the etching. Specialized holders can be used for various substrate materials. The arm is set in a specific position based on the input from the operator. The arm can be further adjusted for different substrates. TOKYO ELECTRON Formula etcher also features an automated feeder to feed up to 4 wafers at once. This system ensures that the device works efficiently and makes the etching process faster. The etching process is clean and efficient, making it ideal for etching delicate substrates. Formula etcher also has several safety measures to prevent accidents and exposure. An on board filter helps to avoid airborne particles during etching and a HEPA filter is provided for post-etching purging. The device is also made of materials which are resistant to high temperatures and other dangerous gases. TEL / TOKYO ELECTRON Formula is capable of both positive and negative etching and can be used to produce patterns of varying size and complexity. The device has a precise and repeatable accuracy and features a user-friendly interface. It is an ideal choice for those looking to etch delicate materials and create semiconductor patterns.
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