Used TEL / TOKYO ELECTRON Formula #9211539 for sale

TEL / TOKYO ELECTRON Formula is a high-speed etching equipment designed for semiconductor device processing. It utilizes a unique multi-directional etching process to achieve maximum efficiency and accuracy. The system is equipped with precision three-dimensional controls to provide the best etching characteristics for each application. TEL Formula is also designed to support a variety of process techniques, including dry and plasma etching. The dry etching process incorporates a volatility beam type with an advanced gas mixture delivery unit. This combination provides a high etching speed and uniformity for thin film deposition. The plasma etching process combines ultra-high density plasma with a high resolution plasmonic structure for superior etch productivity. TOKYO ELECTRON Formula also features a high-density supersonic vapor jet (SVJ) for increased etching efficiency and plasma selectivity. SVJ helps produce a higher etching rate and a lower etching cost compared to traditional etching processes. Additionally, the machine is equipped with an RF power supply tool and various sensors to ensure precise process control. Furthermore, Formula is designed to optimize the etching process by allowing users to select the best etching parameters based on the application. For instance, the user can adjust the gas flow, etching speed, etch depth, trench size, and gas pulse width. This advanced customization capability ensures that users can produce the highest quality devices with the highest etch rate. TEL / TOKYO ELECTRON Formula is a unique etching solution for semiconductor device processing. Its combination of advanced control and customisation features make for faster etching rates, higher accuracy, and superior productivity. It is easy to set up and operate, so even those with limited etching experience can easily get the most out of the asset.