Used TEL / TOKYO ELECTRON Formula #9250261 for sale

TEL / TOKYO ELECTRON Formula
ID: 9250261
Wafer Size: 12"
Nitride furnace, 12".
TEL / TOKYO ELECTRON Formula etcher/asher is a piece of state-of-the-art semiconductor fabrication equipment used for removing and depositing thin films of material to create intricate patterns. It is highly efficient, allowing for robust and accurate etching of patterns onto various types of substrates. The etcher/asher uses a highly advanced etching process which utilizes a combination of chemical and physical techniques. The term etching is used to describe the process of creating a pattern into a substrate. TEL Formula etcher/asher does this by first utilizing a spin-coating technique to deposit a thin film of the material which will be etched into the substrate. After this, the etcher utilizes reactive ion etching capabilities, where an electromagnetic field is applied causing ionized particles to bombard the substrate. This creates a substrate with a topography that allows for precise etching into the material. Following this, an etch mask is created by selectively evaporating, or sputtering, a thin layer of material onto the substrate. This layer of material acts as a barrier to the etching, allowing only certain areas to be etched away while remaining intact in others. In addition to the etching process, TOKYO ELECTRON Formula etcher/asher also contains a sorting system. This system utilizes a photo-resistor sensor to inspect the surface of the substrate and determine where the etching should be performed. This helps to ensure not only accuracy and precision, but also speed and minimal material usage. Formula etcher/asher is an efficient and intricate piece of semiconductor fabrication equipment. This machine utilizes an advanced etching process which, when combined with the sorting system and photo-resistor sensor, creates a highly accurate and precise method of material removal. Through efficient and precise etching, TEL / TOKYO ELECTRON Formula etcher/asher provides a reliable and cost-effective solution to semiconductor fabrication.
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