Used TEL / TOKYO ELECTRON Formula #9256202 for sale

TEL / TOKYO ELECTRON Formula is an etcher/asher that is designed for high precision and automation when performing wafer processing tasks. The advanced features of TEL Formula ensure a repeatable process for creating high-quality components. The platform is driven by a multi-zone vacuum chamber, emitter, and isolation channel, which provide precise and adjustable conditions for etching and ashing applications with a wide range of gases. The etcher/asher is capable of handling wafers up to 200mm in diameter at temperatures of up to 800°C and with a differential pressure of up to 5.7 torrs. It also uses proprietary Control Logic System (CLS) software to precisely control the wafer processing environment and monitor data in real-time. TOKYO ELECTRON Formula features high productivity and film uniformity with a low load of maintenance and supplies. The machine is constructed with a four-story architecture that can be configured based on the customer's application and process requirements. Additionally, Formula can switch between multiple processes, allowing users to customize their etching and ashing applications as needed. TEL / TOKYO ELECTRON Formula also has a human-machine interface (HMI) that enables automated control of etching and ashing parameters and self-diagnosis of system condition. TEL ETLINE series enables quick, cost-effective etching and ashing of various targets, including metals, dielectrics, polysilicon and organics. The series features a high-strength quartz chamber for superior process repeatability and stability, as well as automated process control via an integrated Process Control System (PCS) suite. The ETLINE series is specifically designed to deliver improved process repeatability, repeatability, reproducibility, throughput, and uniformity for all etching and ashing processes. TEL Formula is a state-of-the-art etcher/asher that provides a consistent and repeatable process for creating high-quality components. The platform features advanced features and technologies to ensure precise wafer processing, while also offering high productivity, film uniformity, and low maintenance costs. The ETLINE series is specifically designed for etching and ashing applications, providing improved process repeatability, throughput, and uniformity. All of these features combine to make TOKYO ELECTRON Formula an excellent choice for users in need of precise etching and ashing applications.