Used TEL / TOKYO ELECTRON Formula #9277488 for sale

TEL / TOKYO ELECTRON Formula is an etcher / asher (also known as an ashing equipment) that utilizes plasma to effectively vaporize and remove organic substances from a substrate. TEL Formula's etching technology is designed for high-throughput applications, offering efficient gas utilization and superior throughput performance. The system is capable of processing substrates of up to 200mm in size and utilizes a dual-source configuration (plasma and etching gas) to provide precise etching control. It also features optimized process gas flow, allowing the user to achieve stable and reproducible results. TOKYO ELECTRON Formula features two types of plasma sources - RF and Cold Plasma. The RF source utilizes a wide range of radio frequencies (RF) to sustain the plasma, while the Cold Plasma source employs a DC glow source to activate the gas. Utilizing two plasma sources allows the user to process different types of materials with different etch rates, as well as introducing gradual etch profile that will provide more stable etching result. The unit also features various vacuum levels, ranging from 10.3 Pa up to 100 Pa for effective substrate cleaning and etching processes. An Enhanced WetDes Technology is incorporated to prevent dry particle defects on the substrate. The substrate's temperature can also be controlled from the bottom-up of the chamber. It has a thick pumped oil feature which provides a stable and uniform temperature to prevent the substrate from overheating, increasing the quality of the etching result. Formula also features an integrated process monitoring machine which enables the user to observe and correct process drifting in real-time. It features recipe control to program process parameters, temperature monitoring, etch rate control and endpoint detection. All of these features help to ensure a fast, accurate and repeatable etching process. TEL / TOKYO ELECTRON Formula is an ideal etching tool for a wide range of applications such as crystalline silicon, polysilicon and thin film transistors. In addition, its robust design and multiple plasma sources make it a perfect platform for more advanced etching technologies. It is an effective etcher for manufacturers and research institutions that require high-throughput and precise etching for their work.