Used TEL / TOKYO ELECTRON Formula #9300651 for sale

TEL / TOKYO ELECTRON Formula (TEF) is a high-precision etching/asher used for the production of semi- condition substrates and other sensitive thin-film applications. TEF offers unsurpassed accuracy and stability, making it an ideal tool for more demanding etching and asher applications. The TEF etching/asher has a continuously adjustable etching rate, producing ultra-fine resolutions with minimized line widths. It combines state-of-the-art precision with a long-term reliable etching process to provide precise and repeatable etching and ashing results. The TEF etching/asher is available in a variety of sizes and functions, designed to accommodate any substrates and etching/asher requirements. It can be connected to and installed inside a standard cleanroom setup, allowing for easy maintenance and operation of the etching/asher. The TEF also features an automated powder deposit equipment, which allows for precise deposition of sensitizing powders, allowing for improved etching accuracy and results. TEF etching/asher is powered by dust-free air-bearing and can be used with electrochemicallyactive etchants, typically used in semi-conductor applications. It also features a stainless steel chamber which ensures constant etching/ashing and can be pressurized or depressurized as desired. The TEF can handle a variety of etching/asher process parameters so that different etching and ashing result can be achieved. The TEF etching/asher also features a vision system which can accurately monitor multiple etching/ashing processes in sequence, improving throughput and accuracy. The machine is controlled by a programmable motion controller, providing extreme precision and flexibility to etching and ashing processes. An integrated alarm unit monitors process conditions and can shut down the machine in the event of deviation from standard parameters. For precise etching and ashing of substrates, the TEF etching/asher is an ideal choice. Its superior performance and reliability make it the etching/asher of choice for many semi-conductor and thin-film applications. With its unbeatable precision, easy installation in a standard cleanroom, and automated powder deposit tool, TEF provides an efficient and reliable solution for etching/asher needs.