Used TEL / TOKYO ELECTRON Formula #9412425 for sale

TEL / TOKYO ELECTRON Formula
ID: 9412425
Wafer Size: 12"
Vintage: 2009
Furnaces, 12" 2009 vintage.
TEL / TOKYO ELECTRON Formula (TEF) is an etcher/asher used for precision material removal and creation of patterns on a wide variety of materials. The technology behind the TEF is based on the principle of ion beam etching, which uses an array of high energy ion beams to ablate material from a substrate in order to create microstructures and patterns. The TEF utilizes a variety of gas mixtures, along with etching voltage and power to precisely remove material. The TEF is a versatile and flexible equipment, which can be used to produce highly complex patterns with fine resolution. For example, the TEF can be used to produce fin patterns that are as small as a few nanometers in size with a very high degree of accuracy. It can also be used to create patterns of different shapes and widths over an area of up to 30mm in size. In addition to the above capabilities, the TEF also has the ability to support multiple layers with the same or different etch processes. This means that users can create intricate structures with multiple layers of different materials that can be interconnected in a single operation. Furthermore, the TEF supports a variety of materials such as metals, ceramics, and semiconductors, making it a suitable choice for a wide range of applications. The TEF also offers a number of additional features including the ability to monitor the etching process in real-time, modify etching parameters in response to changing conditions and to control etch times with high accuracy. In addition, it has a user-friendly operating system, which allows users to easily set up etching recipes and to monitor the results. Finally, the TEF is a reliable and robust tool capable of delivering consistent results across a wide variety of projects. Its precision and flexibility make it especially suitable for applications such as semiconductor manufacturing, device fabrication, and microelectronics. It is also a cost-effective choice for producing complex patterns for applications like printed circuit boards and MEMS devices.
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