Used TEL / TOKYO ELECTRON HT-800-P2 #9285736 for sale

TEL / TOKYO ELECTRON HT-800-P2
ID: 9285736
Dry etchers Substrate size: 680 mm x 880 mm.
TEL / TOKYO ELECTRON HT-800-P2 is a high-precision in-line etcher / asher equipment suitable for various wafer processing needs. Utilizing a low pressure etching chamber, the system is capable of extremely uniform etching and ashing on large surface area substrates with high accuracy and repeatability. TEL HT-800-P2 unit integrates high-power ECR plasma source for both etching and ashing with multiple exhaust inert gas via integrated valves in the same chamber. The integrated dry vacuum pump allows for quick exhaust of chemical gases. The etcher / asher machine provides an accurate process in a wide range of applications, including wafer backside cleaning, etching, annealing, and film ashing. The tool also features a wide working pressure range from 10mT to 1000mT including both ultralow vacuum and low-pressure processes, allowing for an extensive etching and ashing process. Its integrated hi-power source also enables precise control of substrate voltage to enable a high etch selectivity for precise etching on various substrate types. The asset also features a precise high-performance substrate chuck for accurate and repeatable wafer positioning and removal. In addition to its versatile process capability, TOKYO ELECTRON HT-800-P2 model also features advanced safeguards for optimal safety and performance. The integrated dual-zone safety interlock equipment quickly detects fault conditions and shuts off the plasma source if such condition occurs, including during cooling operations. The reliable rapid response system is designed to ensure safe operation during emergency situations and keep the unit in optimal condition. HT-800-P2 etcher / asher machine is a reliable and versatile result-driven process tool for diverse microfabrication needs. Its precise process control and efficient safety tool ensures optimal performance and highest reliability in the most demanding conditions. The asset is also highly compatible with other tools to further improve its process versatility and cost-efficiency.
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