Used TEL / TOKYO ELECTRON HT-800-P4 #9285738 for sale

TEL / TOKYO ELECTRON HT-800-P4 is a high-end etching and ashing semiconductor processing equipment designed for the semiconductor device fabrication industry. TEL HT-800-P4 is designed to provide world-class precision and accuracy by utilizing advanced digital controls. The system utilizes a vacuum technology based on "hot-end" and "cold-end" pumps, allowing for quick and easy process changes with no loss in accuracy. The "hot-end" pump is capable of fine-tuned etching and ashing of up to 4X 4 inch substrates in one cycle. Additionally, TOKYO ELECTRON HT-800-P4 features a proprietary oxygen doping technology for enhanced precision control. The unit's hardware control platform also includes a self-tightening chuck mechanism for repeatable and accurate processing. The self-tightening chuck ensures reliable and repeatable results, which is especially essential for production applications. HT-800-P4 is highly versatile and can be configured for a variety of substrate sizes, materials and processes. It is capable of etching and ashing up to 20 different materials, including silicon, glass, plastics and metals. Additionally, the machine can accommodate substrates up to the size of 12 inches. TEL / TOKYO ELECTRON HT-800-P4 is equipped with a multi-zone sample plate that ensures consistent heating and cooling. The plate has six temperature zones and each zone has independent temperature control capability. As a result of its features, TEL HT-800-P4 can reproduce recipes and deliver batch-to-batch consistency. Additionally, it features multi-language control, allowing engineers to program their processing recipes quickly and accurately. This ensures maximum consistency and repeatability of the etching and ashing process. With a wide range of process capabilities, TOKYO ELECTRON HT-800-P4 is ideal for use in the fabrication of advanced semiconductor devices. Its high level of precision and reproducibility, combined with its ease of use, make it a top choice for production and development applications. Additionally, the tool's versatile capabilities make it an excellent choice for research and development as well.