Used TEL / TOKYO ELECTRON Indy-A-L #9411635 for sale

TEL / TOKYO ELECTRON Indy-A-L is an etcher/asher designed for the processing of semiconductor substrates. It has a large number of features that make it suitable for use in a wide range of applications. TEL Indy-A-L features an RIE (reactive ion etch) process that is capable of etching features down to 0.3 μm with a maximum etch rate of 8,000nm/min. This etch process is capable of delivering high-precision results and has the ability to etch a variety of materials such as silicon, gallium nitride, and oxygen-doped silicon. It also features a unique "slanted" etch mode that allows for higher aspect ratios. TOKYO ELECTRON Indy-A-L also includes an onboard advanced scanner that includes an auto focus equipment and a powerful wafer backside monitor. This monitor allows for high resolution imaging of the wafer surface and backside, enabling precise alignment of the etching process with the patterned layers on the substrate. Indy-A-L can also integrate with various external inspection systems to further improve the accuracy and repeatability of the process. TEL / TOKYO ELECTRON Indy-A-L features a high-flow gas delivery system with an impressive flexibility of gas control that allows for a greater range of etch cycles and recipes. The gas delivery unit has a maximum flow rate of 65 SCCM, enabling it to process large substrates quickly. The jet forward module also prevents gas from entering the chamber by forcing it outwards and away from the wafer. TEL Indy-A-L features a robust user interface that allows for easy process parameter setting and recipe changes. The user interface also provides real-time monitoring of etch parameters, as well as recipe storage and recall. The onboard data capture and analysis tools provide data traceability, while the onboard SEM (scanning electron microscope) images and CD (critical dimension) charts allow for easy process and performance evaluation. TOKYO ELECTRON Indy-A-L is an advanced and highly versatile etcher/asher machine that enables the creation of complex patterns with fine details. Its powerful and easily adjustable etching capabilities make it suitable for a wide range of applications and materials, while its feature-rich user interface and monitoring capabilities ensure that the process is well understood and tightly controlled.