Used TEL / TOKYO ELECTRON Indy-B-L #9176040 for sale
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ID: 9176040
Wafer Size: 12"
Vintage: 2008
Vertical MLD AlO/HfO furnace, 12"
Process capability: Al203 and Hf02
Software revision: 6.10R001 (latest version)
Control type: Waves
Com module version: G607R01-A9990000
Dual FOUPS
(16) FOUP Stackers
Options: N2 Load lock, Low temp heater
Includes:
Cabinets / Units / Controllers:
Furnace cabinet
Power supply unit
Control unit
Main controller (WAVES)
Temperature controller
Cassette and wafer handling automation:
Auto tube shutter
Boat elevator with boat rotation mechanism
Wafer load automation
Load port system
Cassette load automation
(16) FOUP Stackers
MLD AlO/HfO Specific option:
Integrated gas system for AlO/HfO process:
Purge N2 gas line
Vaporizer unit for TMA precursor
Vaporizer unit for TEMAH precursor
Ozonizer unit
N2 Load lock:
O2 Density monitor in the loading area
N2 Gas system
Low temperature heater (VMM-56-104)
Vacuum foreline configuration with stainless steel manifold
2nd Gas Box
Set of AlO/HfO quartzware
System options:
Ionizer
UPS
Gas detectors:
TMA
O3
HCL
TEMAH
Octane
Includes:
Manuals
Currently installed
2008 vintage.
TEL / TOKYO ELECTRON Indy-B-L is a versatile etch/asher instrument utilized for the fabrication of semi-conductors. It is designed to provide excellent substrate planarity and excellent shape repeatability during etching and ashing processes. TEL INDY B L employs a unique electrochemical etching equipment that accurately controls etching and ashing rates. This system utilizes a power supply box to control the current density, and a liquid level sensing device to maintain a constant liquid level during the etching/ashing process. As a result, TOKYO ELECTRON INDY B-L offers superior etching and ashing yields. INDY B-L also features an in-built cooling unit that provides faster etching rates as well as a robust design to ensure excellent longevity of the equipment. TEL INDY B-L also boasts a load-lock chamber that enables precise control over the substrate temperature during etching and ashing processes. The chamber also ensures precise micro-cleansing of the substrate, eliminating contaminants and allowing for improved freshness of the substrate for etching and ashing processes. INDY B L features an advanced vacuum-machine that allows for deep sub-micron etching. This tool also ensures etching and ashing rates are accurately maintained, leading to more efficient process control. Furthermore, TOKYO ELECTRON Indy-B-L facilitates the deposition of uniform reagents on the substrate, contributing to improved process yield during etching and ashing processes. TEL Indy-B-L also includes a built-in particle loader that enables the substrate to be quickly and accurately loaded into the etch/asher machine. The loader allows for a rapid formation of vacuum, enabling faster etching and ashing processes. Furthermore, TOKYO ELECTRON INDY B L has an advanced automatic electrochemical mixing-asset that ensures precise control of etching and ashing rates. This model accurately maintains a pH balance during etching and ashing processes, ensuring optimal reaction rates between the substrate and the reagents. Overall, Indy-B-L is an advanced etch/asher instrument that offers excellent etching and ashing yields. Its unique design, precise control, and efficient loading and unloading functions make it an ideal solution for fabricating semi-conductors.
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