Used TEL / TOKYO ELECTRON Indy-B-L #9176040 for sale

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ID: 9176040
Wafer Size: 12"
Vintage: 2008
Vertical MLD AlO/HfO furnace, 12" Process capability: Al203 and Hf02 Software revision: 6.10R001 (latest version) Control type: Waves Com module version: G607R01-A9990000 Dual FOUPS (16) FOUP Stackers Options: N2 Load lock, Low temp heater Includes: Cabinets / Units / Controllers: Furnace cabinet Power supply unit Control unit Main controller (WAVES) Temperature controller Cassette and wafer handling automation: Auto tube shutter Boat elevator with boat rotation mechanism Wafer load automation Load port system Cassette load automation (16) FOUP Stackers MLD AlO/HfO Specific option: Integrated gas system for AlO/HfO process: Purge N2 gas line Vaporizer unit for TMA precursor Vaporizer unit for TEMAH precursor Ozonizer unit N2 Load lock: O2 Density monitor in the loading area N2 Gas system Low temperature heater (VMM-56-104) Vacuum foreline configuration with stainless steel manifold 2nd Gas Box Set of AlO/HfO quartzware System options: Ionizer UPS Gas detectors: TMA O3 HCL TEMAH Octane Includes: Manuals Currently installed 2008 vintage.
TEL / TOKYO ELECTRON Indy-B-L is a versatile etch/asher instrument utilized for the fabrication of semi-conductors. It is designed to provide excellent substrate planarity and excellent shape repeatability during etching and ashing processes. TEL INDY B L employs a unique electrochemical etching equipment that accurately controls etching and ashing rates. This system utilizes a power supply box to control the current density, and a liquid level sensing device to maintain a constant liquid level during the etching/ashing process. As a result, TOKYO ELECTRON INDY B-L offers superior etching and ashing yields. INDY B-L also features an in-built cooling unit that provides faster etching rates as well as a robust design to ensure excellent longevity of the equipment. TEL INDY B-L also boasts a load-lock chamber that enables precise control over the substrate temperature during etching and ashing processes. The chamber also ensures precise micro-cleansing of the substrate, eliminating contaminants and allowing for improved freshness of the substrate for etching and ashing processes. INDY B L features an advanced vacuum-machine that allows for deep sub-micron etching. This tool also ensures etching and ashing rates are accurately maintained, leading to more efficient process control. Furthermore, TOKYO ELECTRON Indy-B-L facilitates the deposition of uniform reagents on the substrate, contributing to improved process yield during etching and ashing processes. TEL Indy-B-L also includes a built-in particle loader that enables the substrate to be quickly and accurately loaded into the etch/asher machine. The loader allows for a rapid formation of vacuum, enabling faster etching and ashing processes. Furthermore, TOKYO ELECTRON INDY B L has an advanced automatic electrochemical mixing-asset that ensures precise control of etching and ashing rates. This model accurately maintains a pH balance during etching and ashing processes, ensuring optimal reaction rates between the substrate and the reagents. Overall, Indy-B-L is an advanced etch/asher instrument that offers excellent etching and ashing yields. Its unique design, precise control, and efficient loading and unloading functions make it an ideal solution for fabricating semi-conductors.
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