Used TEL / TOKYO ELECTRON Indy-B-L #9394496 for sale

TEL / TOKYO ELECTRON Indy-B-L
ID: 9394496
Wafer Size: 12"
Furnace, 12" DCS-Nitride.
TEL (TEL / TOKYO ELECTRON Indy-B-L) is an etcher/asher designed for semiconductor fabrication. It is capable of batch processing up to 100 wafers simultaneously and is highly reliable and reliable. TEL INDY B L comes with a wide variety of etching processes and applications, ranging from shallow trench etch, deep reactive ion etching (DRIE), to vapor etching. The etch process is accomplished using inductively coupled plasma (ICP) with variable frequency and phase to optimize etch uniformity, selectivity, and etch rate. TOKYO ELECTRON INDY B-L also features automated wafer handlings for both wet etching and dry processing applications, including spin rinse drying and wafer alignment. The machine is equipped with a high-accuracy end-point detection equipment for accurate endpoint detection, and an endpoint post-scrub system that enables higher process yields. Additionally, the machine is capable of safely and precisely handling various types of reaction vessels for all etch processes. TOKYO ELECTRON Indy-B-L is equipped with active and passive safety systems to ensure the highest level of user safety and protect the environment. The machine offers a wide range of programmable alarms and safety sensors, such as emergency stop buttons, to detect any unsafe situations. In order to ensure consistent and reliable results, INDY B L is designed for comprehensive process and unit monitoring. The on-board computer machine constantly monitors the process conditions, including pressure, temperature, and other parameters. The machine also features an auto-correction tool to automatically adjust parameters when needed for improved process control. INDY B-L is the ideal choice for semiconductor fabrication, for both low and high volume production due to its high quality and reliable performance. The machine is designed for easy maintenance and quick cleaning in order to minimize downtime and increase overall throughput.
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