Used TEL / TOKYO ELECTRON Indy-B-L #9412423 for sale

TEL / TOKYO ELECTRON Indy-B-L
ID: 9412423
Wafer Size: 12"
Vintage: 2010
Furnaces, 12" 2010 vintage.
TEL / TOKYO ELECTRON Indy-B-L is an etcher / asher which is a type of semiconductor manufacturing equipment used to remove certain materials from a workpiece. It is primarily used to process silicon wafers, but can be used in a range of fabrication processes. TEL INDY B L model of etcher is a resist patterning device that uses plasma etching to efficiently remove materials such as silicon oxide, silicon nitride, or any other dielectric material. This is done by energizing an inert gas such as chlorine, bromine or fluorine to create a plasma which produces ions that interact with the workpiece, breaking the material's chemical bonds and etching away any unwanted material. The device has a sheet size of 6.2" x 7.3", with a repeatable accuracy of +/- 0.1mm. It is capable of an etching rate of 1.49µm/min on silicon wafer and 0.76 µm/min on quartz substrates. Its temperature control range is 25-400°C. The device is configured to allow for maximum temperature uniformity of +/- 2°C and gas distribution uniformity of +/- 10% across the workpiece. TOKYO ELECTRON INDY B-L is also equipped with a cryopump station and has a vacuum control range of 60 - 300 mT and a chamber pressure that can be set to 10 -5 mP. The chamber pressure is adjustable according to the etching process, for example for a deep etching process it is necessary to keep a higher pressure in the chamber. The etching process can also be supervised in real-time thanks to the in-situ monitoring circuitry of the etcher. TOKYO ELECTRON Indy-B-L etcher / asher is a highly advanced and reliable device that is used to process a variety of materials, including silicon, quartz, copper and other materials. Its in-situ monitoring circuitry ensures that the process is reliable and repeatable, while its adjustable pressure and temperature capabilities allow it to be used in a wide range of applications.
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